DiaEtch 110

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Property

Unit

Value

Method

»ö»ó(unexposed)

 

dark-blue

visual

»ö»ó(exposed)

 

bluish

visual

Á¡µµ@ 20¡ÆC

 

*

 

¹Ðµµ(liquid)

g/cm©ø

0.9

gravimetric

¹Ðµµ(solid)

g/cm©ø

1.25

gravimetric

°íÇü¼ººÐ

%wt

35

gravimetric

±¤°¨µµ(Photosensitivity)

Stouffer SSG21

4 - 5

see processing

Ç¥¸é

 

hard-contact exposure

 

* »ç¿ëÇϱâÀü¿¡ Á¡µµ Á¶ÀýÀÀ ÇÒ ÇÊ¿ä°¡ ¾ø½À´Ï´Ù.

Processing

Process step

Typical conditions

Pre-clean

Ensure dry metal surface, free from dust and other contaminants (oil, grease and other stains)

Application

airless-spray-coating

Flash-off

5-10 min at room temperature

Drying

5 - 10 min @ 80¡ÆC in convection oven

Exposure**

150 - 300 mJ/cm©÷ (350 - 400 nm)

Developing

1% aqueous sodium carbonate; 35¡ÆC; 30 - 60 sec

Etching

suitable for acidic media (ferric chloride, cupric chloride); limited stability in alkaline etchants (aqueous ammonia)

Stripping

2 - 5% potassium hydroxide at 50-90¡ÆC

**Heavily depending on exposure equipment used (Intensity, Geometrics)